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US 12,487,438 B2Granted
Observation apparatus and method of visualizing phase object
AssigneeEvident Corporation
InventorTadashi Hirata
Life of this patent
Estimating the term…
Abstract
An observation apparatus includes: an illumination optical system provided below an installation position of a multi-well plate; a reflector provided above the installation position, the reflector being configured to reflect light emitted from the illumination optical system; and an observation optical system provided below the installation position, the observation optical system being configured to condense the light reflected by the reflector. The reflector is installed such that a marginal ray to enter the observation optical system travels via a peripheral well different from an on-axis well located on an optical axis of the observation optical system before reflection due to the reflector.
Claims14
An observation apparatus, comprising:
- an illumination optical system provided below an installation position of a multi-well plate;
- a reflector provided above the installation position, the reflector being configured to reflect light emitted from the illumination optical system;
- and
- an observation optical system provided below the installation position, the observation optical system being configured to condense the light reflected by the reflector,
- wherein the reflector is installed such that a marginal ray to enter the observation optical system travels via a peripheral well different from an on-axis well located on an optical axis of the observation optical system before reflection due to the reflector;
- the reflector is installed such that at least an on-axis marginal ray included in the marginal ray to enter the observation optical system travels via the peripheral well before reflection due to the reflector;
- the reflector serves as a plane mirror, and
- the following conditional expressions are satisfied:
- H
- m
-
- F
-
- C
-
- L
-
- U
- <
- H
- m
- <
- H
- m
-
- F
-
- C
-
- R
-
- B
- (
- 9
-
- ‐
-
- 1
- )
- H
- m
-
- F
-
- C
-
- L
-
- U
- ≡
- k
-
- P
- -
- D
- u
- 2
- -
- N
- a
- ·
- H
- w
- n
- w
- 2
-
- N
- a
- +
- H
- w
- -
- H
- b
- 2
- (
- 10
-
- ‐
-
- 1
- )
- H
- m
-
- F
-
- C
-
- R
-
- B
- ≡
- k
-
- P
- +
- D
- b
- 2
- +
- A
-
- k
-
- P
-
- H
- w
- n
- w
- -
- 2
-
- N
- a
- ·
- H
- w
- (
- 1
- +
- A
-
- H
- w
- n
- w
- )
- n
- w
- 2
-
- N
- a
- (
- 1
- +
- A
-
- H
- w
- n
- w
- )
- 2
- +
- H
- w
- -
- H
- b
- (
- 11
-
- ‐
-
- 1
- )
- where Hm represents a height of location of the reflector with respect to an upper end portion of each well of the multi-well plate,
- Na represents a numerical aperture of the observation optical system,
- k represents an integer of 1 or more,
- P represents a pitch between each well of the multi-well plate,
- Du represents an inner diameter of the upper end portion of each well of the multi-well plate,
- Db represents an inner diameter of a bottom of each well of the multi-well plate,
- nw represents a refractive index of solution housed in each well of the multi-well plate,
- Hw represents a distance from a liquid level of the solution at a center of each well of the multi-well plate to the bottom of the well,
- Hb represents a depth of each well of the multi-well plate, and
- A represents a refractive power of the liquid level.
167 more elements
An observation apparatus, comprising:
- an illumination optical system provided below an installation position of a multi-well plate;
- a reflector provided above the installation position, the reflector being configured to reflect light emitted from the illumination optical system;
- and
- an observation optical system provided below the installation position, the observation optical system being configured to condense the light reflected by the reflector,
- wherein the reflector is installed such that a marginal ray to enter the observation optical system travels via a peripheral well different from an on-axis well located on an optical axis of the observation optical system before reflection due to the reflector;
- the reflector is installed such that at least an on-axis marginal ray included in the marginal ray to enter the observation optical system travels via the peripheral well before reflection due to the reflector;
- the multi-well plate serves as a 96-well plate,
- the reflector serves as a plane mirror, and
- the following conditional expressions are satisfied:
- 2
- .
- 8
- N
- a
- -
- 5
- .
- 1
- [
- mm
- ]
- <
- H
- m
- <
- 5
- .
- 4
- N
- a
- -
- 10.1
- [
- mm
- ]
- (
- 9
-
- ‐
-
- 2
- )
- N
- a
- <
- 0
- .
- 3
-
- 1
- (
- 3
-
- ‐
-
- 2
- )
- where Hm represents a height of location of the reflector with respect to an upper end portion of each well of the multi-well plate, and
- Na represents a numerical aperture on a well side of the observation optical system.
56 more elements
An observation apparatus, comprising:
- an illumination optical system provided below an installation position of a multi-well plate;
- a reflector provided above the installation position, the reflector being configured to reflect light emitted from the illumination optical system;
- and
- an observation optical system provided below the installation position, the observation optical system being configured to condense the light reflected by the reflector,
- wherein the reflector is installed such that a marginal ray to enter the observation optical system travels via a peripheral well different from an on-axis well located on an optical axis of the observation optical system before reflection due to the reflector;
- the reflector is installed such that at least an on-axis marginal ray included in the marginal ray to enter the observation optical system travels via the peripheral well before reflection due to the reflector;
- the multi-well plate serves as a 384-well plate,
- the reflector serves as a plane mirror, and
- the following conditional expressions are satisfied:
- 2
- .
- 2
-
- 5
-
- k
- -
- 0
- .
- 9
-
- 5
- N
- a
- -
- 5
- .
- 3
- [
- mm
- ]
- <
- H
- m
- <
- 1
- .
- 8
-
- 6
-
- k
- +
- 0
- .
- 5
-
- 5
- N
- a
- -
- 10.3
- [
- mm
- ]
- (
- 9
-
- ‐
-
- 3
- )
- N
- a
- <
- 0
- .
- 1
-
- 5
- (
- 3
-
- ‐
-
- 3
- )
- where Hm represents a height of location of the reflector with respect to an upper end portion of each well of the multi-well plate, and
- Na represents a numerical aperture on a well side of the observation optical system, and
- k is 1 or 2.
77 more elements
A method of visualizing a phase object housed in a multi-well plate, the method comprising:
- emitting light from an illumination optical system provided below an installation position of the multi-well plate to the multi-well plate;
- reflecting the light emitted from the illumination optical system with a reflector provided above the installation position;
- and
- condensing the light reflected by the reflector with an observation optical system provided below the installation position,
- wherein the reflecting the light emitted from the illumination optical system includes causing light having traveled via a peripheral well different from an on-axis well located on an optical axis of the observation optical system before reflection due to the reflector, to enter, as a marginal ray, the observation optical system;
- the reflector is installed such that at least an on-axis marginal ray included in the marginal ray to enter the observation optical system travels via the peripheral well before reflection due to the reflector;
- the multi-well plate serves as a 96-well plate,
- the reflector serves as a plane mirror, and
- the following conditional expressions are satisfied:
- 2
- .
- 8
- N
- a
- -
- 5
- .
- 1
- [
- mm
- ]
- <
- H
- m
- <
- 5
- .
- 4
- N
- a
- -
- 10.1
- [
- mm
- ]
- (
- 9
-
- ‐
-
- 2
- )
- N
- a
- <
- 0
- .
- 3
-
- 1
- (
- 3
-
- ‐
-
- 2
- )
- where Hm represents a height of location of the reflector with respect to an upper end portion of each well of the multi-well plate, and
- Na represents a numerical aperture on a well side of the observation optical system.
56 more elements
A method of visualizing a phase object housed in a multi-well plate, the method comprising:
- emitting light from an illumination optical system provided below an installation position of the multi-well plate to the multi-well plate;
- reflecting the light emitted from the illumination optical system with a reflector provided above the installation position;
- and
- condensing the light reflected by the reflector with an observation optical system provided below the installation position,
- wherein the reflecting the light emitted from the illumination optical system includes causing light having traveled via a peripheral well different from an on-axis well located on an optical axis of the observation optical system before reflection due to the reflector, to enter, as a marginal ray, the observation optical system;
- the reflector is installed such that at least an on-axis marginal ray included in the marginal ray to enter the observation optical system travels via the peripheral well before reflection due to the reflector;
- the multi-well plate serves as a 384-well plate,
- the reflector serves as a plane mirror, and
- the following conditional expressions are satisfied:
- 2
- .
- 2
-
- 5
-
- k
- -
- 0
- .
- 9
-
- 5
- N
- a
- -
- 5
- .
- 3
- [
- mm
- ]
- <
- H
- m
- <
- 1
- .
- 8
-
- 6
-
- k
- +
- 0
- .
- 5
-
- 5
- N
- a
- -
- 10.3
- [
- mm
- ]
- (
- 9
-
- ‐
-
- 3
- )
- N
- a
- <
- 0
- .
- 1
-
- 5
- (
- 3
-
- ‐
-
- 3
- )
- where Hm represents a height of location of the reflector with respect to an upper end portion of each well of the multi-well plate, and
- Na represents a numerical aperture on a well side of the observation optical system, and
- k is 1 or 2.
77 more elements
Dependencies are inferred from the claim text.