Back to results
US 12,487,384 B2Granted
Method forming grating device
AssigneeVisEra Technologies Company Limited
InventorsChun-Wei Huang, Yu-Shan Tsai, Po-Han Fu
Life of this patent
Estimating the term…
Abstract
A method forming a grating device includes: providing a substrate; entering the substrate into a process chamber; and depositing a grating material on the substrate to form a grating material layer on the substrate. A refractive index of the grating material gradually changes during depositing the grating material in the process chamber. The grating material layer includes a varying refractive index.
Claims19
A method forming a grating device, comprising:
- providing a substrate;
- forming a plurality of pre-process grating structures on the substrate;
- entering the substrate into a process chamber;
- and
- depositing a grating material on one of sidewalls of each of the plurality of pre-process grating structures to form a grating material layer along a top surface of the substrate, wherein a refractive index of the grating material changes during depositing the grating material in the process chamber, and the grating material layer comprises a varying refractive index, in a horizontal direction parallel to the top surface of the substrate, wherein a top surface of the plurality of pre-process grating structures is free of the grating material during deposition, wherein a refractive index of a portion of the grating material layer adjacent to the plurality of pre-process grating structures equals a refractive index of the substrate.
2 more elements
Dependencies are inferred from the claim text.