Device for modifying a linear substrate
AssigneeSouthwire Company
InventorJuan Alberto Galindo Gonzalez
Life of this patent
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Abstract
An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.
Claims20
A method for modifying an aspect of a linear substrate, the method comprising:
- providing a processing barrel comprising an outer wall having opposing ends, the processing barrel further comprising a modifying fluid comprising additives;
- traversing the linear substrate through the processing barrel at a given speed to infuse the additives to the linear substrate, the linear substrate being in a fluid communication with the modifying fluid, wherein traversing the linear substrate through the processing barrel further comprises increasing or decreasing the given speed;
- defining an exposure length of the linear substrate as a length of the linear substrate that is in the fluid communication with the modifying fluid in the processing barrel;
- and
- configuring the exposure length to greater than zero during an acceleration of the linear substrate from the given speed due to the increase or the decrease of the given speed, wherein configuring the exposure length during the acceleration further comprises:
- increasing the exposure length with an increase in the acceleration of the of the linear substrate from the given speed;
- and
- decreasing the exposure length with a decrease in the acceleration of the of the linear substrate from the given speed.
A method for modifying an aspect of a linear substrate, the method comprising:
- providing a processing barrel comprising an outer processing vessel and an inner processing vessel, the inner processing vessel and the outer processing vessel forming a nested arrangement along a longitudinal length of the processing barrel with at least a portion of a chamber defined therebetween, the processing barrel further comprising a linear substrate inlet and a linear substrate outlet;
- defining an exposure gap between the linear substrate inlet and the linear substrate outlet;
- traversing a linear substrate across the exposure gap at a given speed to infuse additives from a modifying fluid contained in the exposure gap to the linear substrate, wherein traversing the linear substrate further comprises increasing or decreasing the given speed;
- and
- configuring a length of the exposure gap to greater than zero during an acceleration of the linear substrate from the given speed due to the increase or the decrease of the feed speed, wherein configuring the length of the exposure gap during the acceleration further comprises:
- increasing the length of the exposure gap with an increase in the acceleration of the of the linear substrate from the given speed;
- and
- decreasing the length of the exposure gap with a decrease in the acceleration of the of the linear substrate from the given speed.
A method for modifying an aspect of a linear substrate, the method comprising:
- providing a processing barrel comprising an outer processing vessel and an inner processing vessel the inner processing vessel and the outer processing vessel forming a nested arrangement along a longitudinal length of the processing barrel with at least a portion of a chamber defined therebetween, the processing barrel also having a linear substrate inlet and defining an inlet opening into the chamber and a linear substrate outlet and defining an outlet out of the chamber,
- defining an exposure gap between the linear substrate inlet and the linear substrate outlet;
- traversing a linear substrate across the exposure gap at a given speed to infuse additives from a modifying fluid contained in the exposure gap to the linear substrate, wherein traversing the linear substrate further comprises increasing or decreasing the given speed;
- and
- configuring a length of the exposure gap to greater than zero during an acceleration of the linear substrate from the given speed due to the increase or the decrease of the given speed, wherein configuring the length of the exposure gap during the acceleration further comprises:
- increasing the length of the exposure gap with an increase in the acceleration of the of the linear substrate from the given speed;
- and
- decreasing the length of the exposure gap with a decrease in the acceleration of the of the linear substrate from the given speed.
Dependencies are inferred from the claim text.