Method for manufacturing drive circuit, drive circuit and photomask

A method for manufacturing a drive circuit, the drive circuit having a pixel control circuit, the method comprising:

• covering a conductive layer on a substrate;
• covering a photoresist layer on the conductive layer;
• covering a photomask on the photoresist layer and performing exposure;
• wherein the photomask comprises pixel control circuit patterns, and the pixel control circuit patterns are provided with a plurality of interruptions configured to release static electricity generated in the pixel control circuit pattern during exposure, and a length of the interruption between two adjacent pixel control circuit patterns is a preset distance;
• developing to the photoresist layer, and removing an area of the photoresist layer not covered by the pixel control circuit patterns to form a photoresist area;
• and
• etching the conductive layer, and removing an area of the conductive layer not covered by the photoresist area to form the pixel control circuit;
• wherein the pixel control circuit comprises a first color pixel control circuit, a second color pixel control circuit and a third color pixel control circuit;
• and
• the pixel control circuit patterns comprise a first color pixel control circuit pattern, a second color pixel control circuit pattern and, a third color pixel control circuit pattern;
• the step of developing to the photoresist layer, and removing an area of the photoresist layer not covered by the pixel control circuit patterns to form a photoresist area comprises:
• developing to the photoresist layer, and removing an area of the photoresist layer not covered by the first pixel control circuit pattern to form a first sub-photoresist area;
• developing to the photoresist layer, and removing an area of the photoresist layer not covered by the second pixel control circuit pattern to form a second sub-photoresist area;
• and
• developing to the photoresist layer, and removing an area of the photoresist layer not covered by the third pixel control circuit pattern to form a third sub-photoresist area.