EUV photomask inspection apparatus
AssigneeSamsung Electronics Co., Ltd.
InventorsGaram Choi, Taejoong Kim, Jihoon Na, Changhoon Choi
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AssigneeSamsung Electronics Co., Ltd.
InventorsGaram Choi, Taejoong Kim, Jihoon Na, Changhoon Choi
Estimating the term…
An EUV photomask inspection apparatus includes a plurality of optical systems respectively forming different confocal points in a mask structure including an EUV photomask and a pellicle on the EUV photomask. A first optical system among the plurality of optical systems includes a first light source emitting first light having a wavelength in a visible light range, a beam splitter transmitting or reflecting the first light, an objective lens configured to allow the first light to pass through at least a portion of the mask structure to form a first focus in the mask structure, a first light detector configured to detect first reflected light reflected from the mask structure by the incident first light, and a pinhole plate in front of the first light source. The first light detector includes a detection module including a PMT and an APD, and a thermoelectric cooling module.
An extreme ultraviolet (EUV) photomask inspection apparatus comprising:
An EUV photomask inspection apparatus comprising:
An EUV photomask inspection apparatus comprising:
Dependencies are inferred from the claim text.