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US 12,480,207 B2Granted
Tin compound, thin-film forming raw material, thin-film, method for producing thin-film, and halogen compound
AssigneeAdeka Corporation
InventorsTomoharu Yoshino, Atsushi Yamashita, Yoshiki Ooe
Life of this patent
Estimating the term…
Abstract
Provided is a tin compound, which is represented by the following general formula (1): in the formula (1), R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms, R3 and R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and R5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
Claims6
A tin compound, which is represented by the following general formula (1):
- in the formula (1), R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms or an alkylsilyl group having 3 to 12 carbon atoms, R3 and R4 each independently represent an alkyl group having 1 to 5 carbon atoms, and R5 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
Dependencies are inferred from the claim text.