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US 12,480,047 B2Granted
Composition and method for treating substrate
AssigneeFUJIFILM Corporation
InventorsMoe Narita, Atsushi Mizutani
Life of this patent
Estimating the term…
Abstract
A composition contains a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof, an amine compound that is a specific compound represented by Formula (1) or a salt thereof, and water.
Claims17
A composition comprising:
- a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof;
- an amine compound which is a compound represented by the following Formula (1) or a salt thereof;
- and
- water,
- wherein a ratio of a content of the periodic acid compounds to a content of the amine compound is 0.01 or more and less than 45 as a mass ratio,
- R—NH2 Formula (1)
- in Formula (1), R represents an aliphatic hydrocarbon group which optionally has a substituent, the substituent is selected from the group consisting of an amino group, a phosphonic acid group, and a sulfo group, the aliphatic hydrocarbon group optionally has at least one linking group selected from the group consisting of —O—, —S— and
- —NR1— in a carbon chain, R1 represents a hydrogen atom or an aliphatic hydrocarbon group which optionally has a substituent, and the substituent does not include a hydroxy group.
5 more elements
A composition comprising:
- a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof;
- an amine compound selected from the group consisting of 1,3-propanediamine, 1,4-butanediamine, 1,6-hexanediamine, succinic acid amide, malonamide, propanamide, butyramide, and adipamide;
- and
- water,
- wherein the composition substantially does not contain abrasive particles.
2 more elements
A composition comprising:
- a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof;
- an amine compound which is a compound represented by the following Formula (1) or a salt thereof;
- and
- water,
- wherein the composition has a pH of 6.0 or less,
- R—NH2 Formula (1)
- in Formula (1), R represents an aliphatic hydrocarbon group which optionally has a substituent, the substituent is selected from the group consisting of an amino group, a phosphonic acid group, and a sulfo group, the aliphatic hydrocarbon group optionally has at least one linking group selected from the group consisting of —O—, —S— and —NR1— in a carbon chain, R1 represents a hydrogen atom or an aliphatic hydrocarbon group which optionally has a substituent, and the substituent does not include a hydroxy group.
4 more elements
A method for treating a substrate, comprising:
- a step A of removing a ruthenium-containing substance on a substrate by using a composition comprising:
- a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof;
- an amine compound which is a compound represented by the following Formula (1) or a salt thereof;
- and
- water,
- R—NH2 Formula (1)
- in Formula (1), R represents an aliphatic hydrocarbon group which optionally has a substituent, the substituent is selected from the group consisting of an amino group, a phosphonic acid group, and a sulfo group, the aliphatic hydrocarbon group optionally has at least one linking group selected from the group consisting of —O—, —S— and —NR1— in a carbon chain, R1 represents a hydrogen atom or an aliphatic hydrocarbon group which optionally has a substituent, and the substituent does not include a hydroxy group.
4 more elements
Dependencies are inferred from the claim text.