Method of selectively etching a metal component
AssigneeMicrosoft Technology Licensing, LLC
InventorsShivendra Upadhyay, Saulius Vaitiekenas, Charles Masamed Marcus
Life of this patent
Estimating the term…
Abstract
A method of selectively etching a metal component of a workpiece further comprising a ferromagnetic insulator component. The method comprises contacting the metal component with an etchant solution. The etchant solution comprises a basic etchant and a solvent. The method is useful in the context of the fabrication of semiconductor-superconductor-ferromagnetic insulator hybrid devices, for example. The etchant solution may not attack the ferromagnetic insulator component. Also provided is a composition for etching a metal, and a kit comprising the composition and a composition for depositing a styrene-acrylate co-polymer on a surface.
Claims17
A method of selectively etching a metal component of a workpiece comprising a ferromagnetic insulator component situated on a semiconductor component, the metal component having a least a first portion situated on the semiconductor component, the method comprising:
- forming a layer of resist over the metal component and the ferromagnetic insulator component;
- developing the layer of resist to form a mask which exposes at least a portion of the metal component and an edge portion of the ferromagnetic insulator component;
- contacting the exposed portion of the metal component and the edge portion of the ferromagnetic insulator component with an etchant solution, wherein the etchant solution comprises a basic etchant and a solvent, thereby removing the exposed portion of the metal component while preserving the edge portion of the ferromagnetic insulator component.
Dependencies are inferred from the claim text.