Resin composition for stereolithography
AssigneeKuraray Noritake Dental Inc.
InventorsKenji Suzuki, Misaki Ito
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Abstract
The present invention provides a resin composition for stereolithography that enables easy stereolithographical fabrication; and that can produce a cured object having desirable strain recovery, desirable toughness, and desirable water resistance. The present invention relates to a resin composition for stereolithography comprising a polymerizable compound (A) whose homopolymer has a glass transition temperature (Tg) of 37° C. or higher; and a photopolymerization initiator (B), and having a tan δ at 37° C. of 0.3 or less after cure.
Claims21
A resin composition for stereolithography comprising 30 mass % to 90 mass %, based on a total mass % of all polymerizable compounds in said composition, of a polymerizable monomer (A) whose homopolymer has a glass transition temperature (Tg) of 80° C. or higher, and a photopolymerization initiator (B), said resin composition having a tan δ at 37° C. of 0.3 or less after cure.
Dependencies are inferred from the claim text.