Photonic structure and method for manufacturing the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsMing Yang Jung, Stefan Rusu, Cheng-Tse Tang
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Abstract
A photonic structure and a method for manufacturing the same are provided. The photonic structure includes a substrate, an insulating structure, a first waveguide layer, a second waveguide layer and a high-dielectric constant material. The insulating structure is located over the substrate. The first waveguide layer is embedded in the insulating structure. The second waveguide layer is embedded in the insulating structure and longitudinally spaced apart from the first waveguide layer. The high-dielectric constant material is disposed between the first waveguide layer and the second waveguide layer.
Claims20
A photonic structure, comprising:
- a substrate;
- an insulating structure located over the substrate along a first direction;
- a first waveguide layer embedded in the insulating structure and over the substrate along the first direction;
- a second waveguide layer embedded in the insulating structure and spaced apart from the first waveguide layer along the first direction;
- and
- a coupling material disposed between the first waveguide layer and the second waveguide layer and configured to transfer light between the first waveguide layer and the second waveguide layer,
- wherein the coupling material has a length greater than a length of the first waveguide layer along a second direction different from the first direction and is surrounded by the insulating structure along the second direction, and a dielectric constant of the coupling material is greater than a dielectric constant of the insulating structure.
A photonic structure, comprising:
- a substrate;
- an insulating structure located over the substrate along a first direction;
- a first waveguide layer and a second waveguide layer arranged along the first direction;
- and
- a coupling material disposed between the first waveguide layer and the second waveguide layer along the first direction and surrounded by the insulating structure along a second direction different from the first direction, wherein a dielectric constant of the coupling material is greater than a dielectric constant of the insulating structure, and wherein the first waveguide layer has a surface area less than a surface area of the coupling material in a top view.
A method for manufacturing a photonic structure, comprising:
- providing a substrate;
- forming an insulating structure over the substrate along a first direction;
- forming a first waveguide layer over the substrate;
- forming a coupling material over the first waveguide layer along the first direction;
- forming a second waveguide layer over the coupling material along the first direction,
- wherein the coupling material is surrounded by the insulating structure along a second direction substantially orthogonal to the first direction,
- and wherein a dielectric constant of the coupling material is greater than a dielectric constant of the insulating structure, and the coupling material has a length greater than a length of the first waveguide layer along the second direction.
Dependencies are inferred from the claim text.