Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same
AssigneeDnf Co., Ltd.
InventorsYong Hee Kwone, Young Jae Im, Sang Yong Jeon, Tae Seok Byun, Sang Chan Lee, Sang Ick Lee
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Abstract
Provided are a composition for depositing an antimony-containing thin film including a novel antimony compound which may be useful as a precursor of an antimony-containing thin film and a method for manufacturing an antimony-containing thin film using the same.
Claims14
A composition for depositing an antimony-containing thin film comprising:
- an antimony compound represented by the following Chemical Formula 1:
- wherein
- R1 to R4 are independently of one another linear or branched (C1-C7) alkyl;
- and
- R 5 is branched (C3-C7) alkyl.
A method for manufacturing an antimony-containing thin film, comprising reacting a reaction gas with an antimony compound represented by the following Chemical Formula 1:
- wherein R1 to R5 are independently of one another linear or branched (C1-C7) alkyl.
An antimony compound represented by the following Chemical Formula 1:
- wherein
- R1 to R4 are independently of one another linear or branched (C1-C7) alkyl;
- and
- R5 is branched (C3-C7) alkyl.
Dependencies are inferred from the claim text.