Composition for tungsten CMP
AssigneeCMC Materials, Inc.
InventorsKevin P. Dockery, Tyler Carter, Matthew E. Carnes, Jessica VanKuiken, Pankaj Singh
Life of this patent
Estimating the term…
Abstract
A chemical mechanical polishing composition for polishing a substrate having a tungsten layer includes a water based liquid carrier, abrasive particles dispersed in the liquid carrier, an iron containing accelerator, and a cationic polymer having an amino acid monomer. A method for chemical mechanical polishing a substrate including a tungsten layer includes contacting the substrate with the above-described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the tungsten from the substrate and thereby polish the substrate.
Claims10
A chemical mechanical polishing composition comprising:
- a water based liquid carrier;
- abrasive particles dispersed in the liquid carrier, wherein the abrasive particles comprise a colloidal silica abrasive, and the colloidal silica abrasive has a permanent positive charge of at least 10 mV, wherein the permanent positive charge is obtained by incorporating an aminosilane compound in the colloidal silica particles;
- an iron containing accelerator, wherein the iron containing accelerator is a soluble iron containing catalyst present in the composition in an amount sufficient to provide a range from about 0.5 to about 20 ppm Fe based on the total weight of the composition;
- a hydrogen peroxide oxidizer;
- and
- a cationic polymer having an amino acid monomer unit, wherein the cationic polymer comprises at least one of polylysine, polyarginine, and polyhistidine.
A chemical mechanical polishing composition comprising:
- a water based liquid carrier;
- colloidal silica abrasive particles dispersed in the liquid carrier, wherein the colloidal silica abrasive has a permanent positive charge of at least 10 mV, and wherein the permanent positive charge is obtained by incorporating an aminosilane compound in the colloidal silica particles;
- a soluble iron containing catalyst present in the composition in an amount sufficient to provide a range from about 0.5 to about 20 ppm Fe based on the total weight of the composition;
- a hydrogen peroxide oxidizer;
- a stabilizer bound to the soluble iron containing catalyst;
- a cationic polymer having an amino acid monomer unit, the cationic polymer comprising at least one of polylysine, polyarginine, and polyhistidine;
- and
- wherein the composition has a pH in a range from about 1 to about 5.
Dependencies are inferred from the claim text.