Self-healing oligomers and the use thereof
AssigneeCovestro (Netherlands) B.V.
InventorsMeng He, Sam Hsieh, Jim Lin
Life of this patent
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AssigneeCovestro (Netherlands) B.V.
InventorsMeng He, Sam Hsieh, Jim Lin
Estimating the term…
Disclosed herein are self-healing oligomers according to the structure [UPy-(Dm-U-Dm)(2+q)]-[A(G)(n−1)-Dm]k-Z; wherein UPy, D, m, U, q, A, G, n, k, and Z are defined and described further herein, and wherein the oligomer possesses at least 3 urethane linking groups and comprises a backbone derived from a polyether polyol, a polyester polyol, a poly(dimethylsiloxane), a disulfide polyol, or combinations thereof. Also described and claimed are various compositions containing such oligomers as part of a self-healing component, wherein such compositions also include an optional reactive monomer and/or oligomer component and a photoinitiator component. Yet further described and claimed are articles cured from the compositions elsewhere described using the oligomers elsewhere described.
A self-healing oligomer according to the following structure (VII):
Dependencies are inferred from the claim text.