Grounding techniques for ESD polymeric fluid lines
AssigneeApplied Materials, Inc.
InventorsChad Pollard, Shou-Sung Chang, Haosheng Wu
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AssigneeApplied Materials, Inc.
InventorsChad Pollard, Shou-Sung Chang, Haosheng Wu
Estimating the term…
A chemical mechanical polishing assembly includes a chemical mechanical polishing system, a fluid source, and a fluid delivery conduit to carry a fluid from the fluid source into the chemical mechanical polishing system. The polishing system has a platen to support a polishing pad, a carrier head to support a substrate and bring the substrate into contact with the polishing pad, and a motor to cause relative motion between platen and the carrier head. The fluid delivery conduit includes a conductive wire extending through an interior of the conduit to flow electrostatic discharge to a ground, and a wire extraction fitting covering and sealing a location where the conductive wire passes through a wall of the fluid delivery conduit.
A chemical mechanical polishing assembly, comprising:
A chemical mechanical polishing assembly, comprising:
A chemical mechanical polishing assembly, comprising:
Dependencies are inferred from the claim text.