Apparatus for cleaning semiconductor equipment

An apparatus, comprising:

• a casing constructed to be detachably mounted on a processing chamber;
• a first shaft extending though the casing and constructed to move along a first axis and rotate around the first axis;
• a rail coupled to the first shaft and constructed to move along a second axis;
• an arm pivotally coupled to the rail and constructed to rotate around a third axis;
• and
• a cleaning head attached to the arm and constructed to move along a longitudinal axis of the arm,
• wherein the apparatus is constructed to form a sealed space with a chamber wall of the processing chamber and clean the chamber wall during a cleaning operation,
• wherein the casing comprises a first plate and a second plate opposite to the first plate, wherein the first plate and the second plate are constructed to move in response to movement of the casing,
• wherein the second plate is constructed to move and rest over a periphery of an upper surface of a body of the processing chamber when the casing is mounted on the processing chamber.

An apparatus, comprising:

• a casing constructed to be detachably mounted on a processing chamber and comprising:
• a first plate;
• and
• a second plate opposite to the first plate and constructed to supply a liquid, the second plate defining a first opening constructed to face a second opening of the processing chamber;
• a shaft constructed to move along a first axis though the first plate and to rotate around the first axis;
• a rail coupled to the shaft and constructed to move along a second axis parallel to a surface of the first plate;
• an arm pivotally coupled to the rail;
• and
• a cleaning head attached to the arm and constructed to rotate around a longitudinal axis of the arm,
• wherein the cleaning head is constructed to extend into processing chamber on a side of the second opening opposite to the first plate,
• wherein the first plate and the second plate are constructed to move in response to movement of the casing,
• wherein the second plate comprises four sides constructed to rest over corresponding four sides of an upper surface of the processing chamber from a top-view perspective when the casing is mounted on the processing chamber.