Substrate processing apparatus
AssigneeShibaura Mechatronics Corporation
InventorsKensuke Demura, Satoshi Nakamura, Masaya Kamiya, Minami Nakamura
Life of this patent
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Abstract
According to one embodiment, a substrate processing apparatus includes: a stage rotatable around a central axis; a plurality of holders provided on the stage to hold a substrate; a cooler capable of supplying a cooling gas to a space between the stage and the substrate; and a liquid supply capable of supplying a liquid to a surface of the substrate on an opposite side to the stage. When holding the substrate, each of the plurality of holders moves toward the central axis along a surface of the stage so as to surround a peripheral edge of the substrate and the space between the stage and the substrate.
Claims10
A substrate processing apparatus comprising:
- a stage configured to rotate around a central axis;
- a plurality of holders provided on the stage and configured to hold a substrate;
- a cooler configured to supply a cooling gas to a space between the stage and the substrate;
- and
- a liquid supply configured to supply a liquid to a surface of the substrate on an opposite side to the stage,
- wherein, when holding the substrate, the plurality of holders moves toward the central axis of the stage along a surface of the stage to surround a peripheral edge of the substrate in its entirety, thereby closing the space between the stage and the substrate.
Dependencies are inferred from the claim text.