Plasma process system for multi-station
AssigneeEn2Core Technology, Inc.
InventorsSae Hoon Uhm, Dong Jegal, Yeonghoon Sohn, Gyueng Hyuen Choe, Se Hong Park, Jin Huh
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Abstract
According to one embodiment of the present disclosure, there can be provided a plasma processing system for multi-station, the system including a processing chamber including at least two or more stations, one plasma generator provided for each of the stations, one inverter provided for each of the plasma generators, a sensing unit configured to measure an electric characteristic of each of the plasma generators, and a controller configured to acquire sensing data from the sensing unit and control each of the inverters.
Claims20
A system for plasma processing for multi station, the system comprising:
- a processing chamber including a first station and a second station;
- a first plasma generator coupled to the first station;
- a first inverter configured to provide AC power to the first plasma generator;
- a first sensing unit configured to sense electric characteristics related to the first plasma generator;
- a second plasma generator coupled to the second station;
- a second inverter configured to provide AC power to the second plasma generator;
- a second sensing unit configured to sense electric characteristics related to the second plasma generator;
- and
- a controller configured to control the first inverter and the second inverter,
- wherein the first plasma generator includes a first discharge tube fluidically coupled to the first station and a first antenna structure placed to surround the first discharge tube,
- wherein the second plasma generator includes a second discharge tube fluidically coupled to the second station and a second antenna structure placed to surround the second discharge tube,
- wherein the first antenna structure is configured to receive AC power from the first inverter and induce plasma inside the first discharge tube, and
- wherein the second antenna structure is configured to receive AC power from the second inverter and induce plasma inside the second discharge tube.
Dependencies are inferred from the claim text.