Device and method for measuring a substrate

A device for measuring a substrate having a plurality of layers, said device comprising:

• at least one optical device selected from the group consisting of an ellipsometer, a reflectometer, a scatterometer, and a spectrometer, the at least one optical device being configured to measure and determine the layers of the substrate simultaneously using ellipsometry to obtain measurement results, the measurement results including a loss angle and a phase shift of the plurality of layers;
• and
• a computer-assisted data processing system configured to save the obtained measurement results, create a simulation of the substrate using the saved measurement results to obtain simulation results, compare the saved measurement results with the obtained simulation results, optimize the created simulation of the substrate and create a renewed simulation of the substrate using the saved measurement results, and analyze and optimize further substrates by reconstructing layer and/or structure parameters of the substrate using the renewed simulation, on the basis of measurement results from measuring the further substrates using the at least one optical device,
• wherein the ellipsometry is:
• VUV/UV/VIS/NIR variable angle spectral ellipsometry (VASE) in reflection or transmission mode, wherein a measuring range extends from vacuum ultraviolet (VUV) through to near infrared (NIR), from 146 nm to 1700 nm,
• IR variable angle spectral ellipsometry (VASE) in reflection or transmission mode, wherein a spectral measuring range extends from 1.7 μm to 30 μm, or a combination thereof.