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US 12,460,131 B2Granted
Surfactants for electronics products
AssigneeAdvanSix Resins & Chemicals LLC
InventorEdward Asirvatham
Life of this patent
Estimating the term…
Abstract
Pre-texturing agents, etchants, and photoresist stripping agents may be formulated to include one or more surfactants, from one or more surfactant classes, such as derivatives of amino acids that have surface-active properties.
Claims17
A formulation for a pre-texturing agent, comprising:
- at least one surfactant of Formula I,
- wherein R1 and R2 may be the same or different, and may be selected from the group consisting of hydrogen and C1-C6 alkyl, wherein the C1-C6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
- n is an integer from 2 to 5;
- m is an integer from 12 to 18;
- which identifies the number of carbon atoms in a straight alkyl chain;
- the terminal nitrogen is optionally further substituted with R3, wherein R3 is selected from the group consisting of hydrogen, oxygen, hydroxyl, and C1-C6 alkyl, wherein the C1-C6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
- an optional counterion associated with the compound which, if present, is selected from the group consisting of chloride, bromide, iodide, and hydroxide;
- and
- at least one of one or more solvents and one or more defoaming agents.
6 more elements
A formulation for an etchant, comprising:
- at least one surfactant of Formula I,
- wherein R1 and R2 may be the same or different, and may be selected from the group consisting of hydrogen and C1-C6 alkyl, wherein the C1-C6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
- n is an integer from 2 to 5;
- m is an integer from 12 to 18 which identifies the number of carbon atoms in a straight alkyl chain;
- the terminal nitrogen is optionally further substituted with R3, wherein R3 is selected from the group consisting of hydrogen, oxygen, hydroxyl, and C1-C6 alkyl, wherein the C1-C6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
- an optional counterion associated with the compound which, if present, is selected from the group consisting of chloride, bromide, iodide, and hydroxide;
- and
- hydrofluoric acid (1f).
5 more elements
A formulation for a photoresist stripping formulation, comprising:
- at least one surfactant of Formula I,
- wherein R1 and R2 may be the same or different, and may be selected from the group consisting of hydrogen and C1-C6 alkyl, wherein the C1-C6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
- n is an integer from 2 to 5;
- m is an integer from 12 to 18 which identifies the number of carbon atoms in a straight alkyl chain;
- the terminal nitrogen is optionally further substituted with R3, wherein R3 is selected from the group consisting of hydrogen, oxygen, hydroxyl, and C1-C6 alkyl, wherein the C1-C6 alkyl may optionally be substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, carbonyl, and carboxylate;
- an optional counterion associated with the compound which, if present, is selected from the group consisting of chloride, bromide, iodide, and hydroxide;
- and
- an alkanolamine.
5 more elements
Dependencies are inferred from the claim text.