Method of processing liquid containing ammonia nitrogen from semiconductor fabrication machine
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsEn Tian Lin, Chiao-Ling Weng
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Abstract
The present disclosure provides a method of processing a liquid containing ammonia nitrogen from a first semiconductor fabrication machine. The method includes: adsorbing a plurality of ammonium (NH4+) ions in the liquid; desorbing the plurality of NH4+ ions to a solution; converting a fraction of the plurality of NH4+ ions into a plurality of ammonia (NH3) molecules; and electrolyzing the plurality of NH3 molecules to become a plurality of hydrogen (H2) molecules and a plurality of nitrogen (N2) molecules.
Claims20
A method of processing a liquid containing ammonia nitrogen from a first semiconductor fabrication machine, the method comprising:
- adsorbing a plurality of ammonium (NH4+) ions in the liquid;
- transferring the plurality of adsorbed NH4+ ions to an aqueous solution which is substantially neutral;
- adding sulfuric acid to the aqueous solution to desorb the plurality of adsorbed NH4+ ions by forming a plurality of ammonium sulfate ((NH4)2SO4) molecules in the aqueous solution;
- adding an alkaline solution to the aqueous solution to convert a fraction of the plurality of ammonium sulfate molecules into a plurality of ammonia (NH3) molecules;
- and
- electrolyzing the plurality of NH3 molecules to become a plurality of hydrogen (H2) molecules and a plurality of nitrogen (N2) molecules.
A method for producing hydrogen gas from a liquid containing ammonia nitrogen, the method comprising:
- collecting the liquid from a semiconductor fabrication machine;
- adsorbing a plurality of NH4+ ions in the liquid;
- transferring the plurality of adsorbed NH4+ ions to an aqueous solution which is substantially neutral;
- adding sulfuric acid to the aqueous solution to desorb the plurality of adsorbed NH4+ ions by forming a plurality of ammonium sulfate ((NH4)2SO4) molecules in the aqueous solution;
- increasing a temperature of the aqueous solution to be greater than 40° C.;
- adding an alkaline solution to the aqueous solution to convert the plurality of ammonium sulfate molecules into a plurality of ammonia (NH3) molecules;
- and
- decomposing the plurality of NH3 molecules into a plurality of H2 molecules and a plurality of N2 molecules.
A method for providing hydrogen gas to a semiconductor production tool, comprising:
- providing an aqueous medium having a first concentration of NH4+ ions;
- passing the aqueous medium through a zeolite to trap the NH4+ ions by the zeolite;
- transferring the NH4+ ions trapped by the zeolite to an aqueous solution which is substantially neutral;
- adding sulfuric acid to the aqueous solution to release the NH4+ ions from the zeolite by forming ammonium sulfate ((NH4)2SO4) molecules in the aqueous solution;
- increasing a pH value of the aqueous solution to be greater than 11 at room temperature to convert a fraction of the (NH4)2SO4 molecules into NH3 molecules;
- electrolyzing the NH3 molecules to produce H2 molecules and N2 molecules;
- and
- providing the H2 molecules to the semiconductor production tool.
Dependencies are inferred from the claim text.