EUV light generation apparatus, electronic device manufacturing method, and inspection method

An electronic device manufacturing method, comprising:

• generating EUV light by irradiating a target with pulse laser light in an EUV light generation apparatus;
• outputting the EUV light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the EUV light in the exposure apparatus to manufacture an electronic device,
• the EUV light generation apparatus including:
• a prepulse laser configured to output prepulse laser light to be radiated to the target supplied into a chamber;
• a main pulse laser configured to output main pulse laser light to be radiated to the target irradiated with the prepulse laser light;
• a combiner configured to combine optical paths of the prepulse laser light and the main pulse laser light;
• a light concentrating unit configured to concentrate, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined;
• a stage configured to change a position of the light concentrating unit;
• a first actuator arranged upstream of the combiner and configured to change a travel direction of the main pulse laser light before the optical paths are combined;
• an EUV light sensor configured to detect EUV energy of the EUV light radiated from the target irradiated with the main pulse laser light;
• and
• a laser energy sensor configured to detect pulse energy of the main pulse laser light before being radiated to the target,
• wherein the EUV light generation apparatus is configured to control the stage so that temporal variation of the EUV energy detected by the EUV light sensor decreases and to control the first actuator so that a ratio of the EUV energy with respect to the pulse energy detected by the laser energy sensor increases.

An inspection method comprising:

• generating EUV light by irradiating a target with pulse laser light in an EUV light generation apparatus;
• outputting the EUV light to an inspection apparatus as a light source for inspection;
• and
• exposing a mask to the EUV light to inspect the mask in the inspection apparatus,
• the EUV light generation apparatus including:
• a prepulse laser configured to output prepulse laser light to be radiated to the target supplied into a chamber;
• a main pulse laser configured to output main pulse laser light to be radiated to the target irradiated with the prepulse laser light;
• a combiner configured to combine optical paths of the prepulse laser light and the main pulse laser light;
• a light concentrating unit configured to concentrate, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined;
• a stage configured to change a position of the light concentrating unit;
• a first actuator arranged upstream of the combiner and configured to change a travel direction of the main pulse laser light before the optical paths are combined;
• an EUV light sensor configured to detect EUV energy of the EUV light radiated from the target irradiated with the main pulse laser light;
• and
• a laser energy sensor configured to detect pulse energy of the main pulse laser light before being radiated to the target,
• wherein the EUV light generation apparatus is configured to control the stage so that temporal variation of the EUV energy detected by the EUV light sensor decreases and to control the first actuator so that a ratio of the EUV energy with respect to the pulse energy detected by the laser energy sensor increases.