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US 12,454,505 B2Granted
Method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester having high-purity used in photo resist process
AssigneeJaewon Industrial Co., Ltd
InventorsSung Won Shim, Byung Ki Son, Hwan Choi, Youn Soo Shin, Hwa Yeong Choi, Ho Jeong
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Abstract
Provided is a method for purifying an alkylene glycol monoalkyl ether carboxylic acid ester (AGAECE) for photoresist processing, wherein the method comprises the step of distillation after passing industrial AGAECE through a porous adsorbent impregnated with a basic material, and it is possible to obtain a semiconductor-grade high-purity AGAECE maintaining a low acid value and high purity according to the present invention.
Claims10
A method of purifying an alkylene glycol monoalkyl ether carboxylic acid ester for photoresist process, comprising the steps of:
- impregnating a porous adsorbent with a basic material;
- lowering the acidity by passing an alkylene glycol monoalkyl ether carboxylic acid ester (AGAECE) as a raw material through the porous adsorbent impregnated with a basic material;
- and
- distilling the AGAECE that has passed through the porous adsorbent,
- wherein the AGAECE is represented by Formula 1, and an antioxidant is added in the distillation step:
- wherein R1 is hydrogen or a C1-C8alkyl group, R2 and R3 are each independently hydrogen or a C1-C11 alkyl group, and n is an integer of 1 to 11, provided that when n is an integer of 2 or more, each R2 is the same as or different from each other.
3 more elements
Dependencies are inferred from the claim text.