Chemical liquid and chemical liquid storage body

A method for producing a pattern using a resist composition and a chemical liquid comprising,

• a step of forming a resist film by applying the resist composition to the substrate,
• a step of exposing the resist film using an EUV exposure machine, and
• a step of developing the resist film with the chemical liquid to form the pattern, and
• wherein the chemical liquid comprises one or more organic solvents selected from the group consisting of decane, undecane, and a compound other than an alkane and an alkene and
• one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and
• wherein a content of the organic components is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.

A method for producing a pattern using a resist composition and a chemical liquid comprising,

• a step of forming a resist film by applying the resist composition to the substrate,
• a step of exposing the resist film using an EUV exposure machine,
• a step of developing the resist film to form the pattern, and
• a step of rinsing the pattern with the chemical liquid, and
• wherein the chemical liquid comprises one or more organic solvents selected from the group consisting of decane, undecane, and a compound other than an alkane and an alkene and
• one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and
• wherein a content of the organic components is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.