Structure, method for manufacturing structure, and composition

A structure comprising:

• a substrate;
• a plurality of coiled passive elements disposed on the substrate and having opening portions that open to a surface of the substrate;
• and
• an electromagnetic wave absorbing film positioned in at least one opening portion among the opening portions of the plurality of coiled passive elements disposed on the substrate,
• wherein the coiled passive element is selected from the group consisting of an inductor and a balun,
• the electromagnetic wave absorbing film contains magnetic particles, and
• in a case where a real part of a complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ′ and a complex part of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ″, the complex part μ″ of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3,
• the requirement 1:
• μ″ at a frequency of 28 GHz is 0.1 to 10
• the requirement 2:
• μ″ at a frequency of 47 GHz is 0.1 to 5
• the requirement 3:
• μ″ at a frequency of 60 GHz is 0.1 to 2.

A structure comprising:

• a substrate;
• a plurality of passive elements disposed on the substrate;
• and
• an electromagnetic wave absorbing film provided at least one of between the substrate and the passive element or on an opposite side of the substrate of the passive element,
• wherein the passive element is selected from the group consisting of an inductor and a balun,
• the electromagnetic wave absorbing film contains magnetic particles, and
• in a case where a real part of a complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ′ and a complex part of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ″, the complex part μ″ of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3,
• the requirement 1:
• μ″ at a frequency of 28 GHz is 0.1 to 10
• the requirement 2:
• μ″ at a frequency of 47 GHz is 0.1 to 5
• the requirement 3:
• μ″ at a frequency of 60 GHz is 0.1 to 2.

A method for manufacturing a structure, comprising:

• a step of forming a composition layer by applying a photosensitive composition containing magnetic particles onto a substrate on which a plurality of passive elements are disposed;
• and
• a step of subjecting the composition layer to an exposure treatment and a development treatment to form an electromagnetic wave absorbing film positioned at least in a region between the passive elements facing each other among the plurality of passive elements disposed on the substrate,
• wherein the passive element is selected from the group consisting of an inductor and a balun, and
• in a case where a real part of a complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ′ and a complex part of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ″, the complex part μ″ of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3,
• the requirement 1:
• μ″ at a frequency of 28 GHz is 0.1 to 10
• the requirement 2:
• μ″ at a frequency of 47 GHz is 0.1 to 5
• the requirement 3:
• μ″ at a frequency of 60 GHz is 0.1 to 2.

A method for manufacturing a structure, comprising:

• a step of forming a composition layer by applying a photosensitive composition containing magnetic particles onto at least one opening portion of a plurality of coiled passive elements disposed on a substrate and having opening portions that open to a surface of the substrate;
• and
• a step of subjecting the composition layer to an exposure treatment and a development treatment to form an electromagnetic wave absorbing film positioned in at least one opening portion among the opening portions of the plurality of coiled passive elements disposed on the substrate,
• wherein the coiled passive element is selected from the group consisting of an inductor and a balun, and
• in a case where a real part of a complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ′ and a complex part of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ″, the complex part μ″ of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3,
• the requirement 1:
• μ″ at a frequency of 28 GHz is 0.1 to 10
• the requirement 2:
• μ″ at a frequency of 47 GHz is 0.1 to 5
• the requirement 3:
• μ″ at a frequency of 60 GHz is 0.1 to 2.

A method for manufacturing a structure, comprising:

• a step of forming a composition layer by applying a photosensitive composition containing magnetic particles onto a substrate;
• a step of subjecting the composition layer to an exposure treatment and a development treatment to form an electromagnetic wave absorbing film on the substrate;
• and
• a step of forming a plurality of passive elements on the electromagnetic wave absorbing film,
• wherein the passive element is selected from the group consisting of an inductor and a balun,
• in a case where a real part of a complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ′ and a complex part of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ″, the complex part μ″ of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3,
• the requirement 1:
• μ″ at a frequency of 28 GHz is 0.1 to 10
• the requirement 2:
• μ″ at a frequency of 47 GHz is 0.1 to 5
• the requirement 3:
• μ″ at a frequency of 60 GHz is 0.1 to 2.

A method for manufacturing a structure, comprising:

• a step of forming a composition layer by applying a photosensitive composition containing magnetic particles onto a substrate on which a plurality of passive elements are disposed;
• and
• a step of subjecting the composition layer to an exposure treatment and a development treatment to form an electromagnetic wave absorbing film on the plurality of passive elements,
• wherein the passive element is selected from the group consisting of an inductor and a balun,
• in a case where a real part of a complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ′ and a complex part of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film is defined as μ″, the complex part μ″ of the complex relative magnetic permeability μ of the electromagnetic wave absorbing film satisfies any one of requirements 1 to 3,
• the requirement 1:
• μ″ at a frequency of 28 GHz is 0.1 to 10
• the requirement 2:
• μ″ at a frequency of 47 GHz is 0.1 to 5
• the requirement 3:
• μ″ at a frequency of 60 GHz is 0.1 to 2.