3D virtual ground memory and manufacturing methods for same
AssigneeMacronix International Co., Ltd.
InventorsErh-Kun Lai, Hsiang-Lan Lung
Life of this patent
Estimating the term…
Loading patent…
AssigneeMacronix International Co., Ltd.
InventorsErh-Kun Lai, Hsiang-Lan Lung
Estimating the term…
Memory devices are implemented within a vertical memory structure, comprising a stack of alternating layers of insulator material and word line material, with a series of alternating conductive pillars and insulating pillars disposed through stack. Data storage structures are disposed on inside surfaces of the layers of word line material at cross-points of the insulating pillars and the layers of word line material. Semiconductor channel material is disposed between the insulating pillars and the data storage structures at cross-points of the insulating pillars with the layers of word line material. The semiconductor channel material extends around an outside surface of the insulating pillars, contacting the adjacent conductive pillars on both sides to provide source/drain terminals.
A vertical memory structure, comprising:
A vertical memory structure, comprising:
Dependencies are inferred from the claim text.