Process stop loss reduction system through rapid replacement of apparatus for trapping of reaction by-product for semiconductor process

A process stop loss reduction system through rapid replacement of an apparatus for trapping of a reaction by-product for a semiconductor process, comprising:

• a direction switching valve (1) configured to switch a flow path for exhaust gas or inert gas discharged from a process chamber;
• a trapping apparatus (2) having an inner trapping apparatus configured to receive the exhaust gas and trap a reaction by-product;
• a process chamber facility controller (7) configured to detect a change in pressure in the process chamber and the trapping apparatus;
• a heating gate valve (4) configured to receive any one of the exhaust gas and the inert gas from the trapping apparatus and supply any one of the exhaust gas and the inert gas to an exhaust pipe connected to a vacuum pump at a rear end, wherein the heating gate valve (4) is configured to heat any one of the exhaust gas and the inert gas passing therethrough to prevent the by-product from forming in the heating gate valve;
• a bypass pipe (3) configured to receive the inert gas through the direction switching valve (1) and supply the inert gas to the exhaust pipe;
• and
• a trapping system controller (5) configured to communicate with the process chamber facility controller (7) and control the direction switching valve and the heating gate valve,
• wherein the trapping system controller (5) controls the direction switching valve (1) and the heating gate valve (4), while the process chamber and the trapping apparatus are operating in normal state, to open the flow path through the direction switching valve (1), the trapping apparatus (2) and the heating gate valve (4), and closes the flow path through the bypass pipe (3) such that the trapping apparatus (2) is configured to receive the exhaust gas, and
• wherein the trapping system controller (5) controls the direction switching valve (1) and the heating gate valve (4), when a signal is received from the process chamber facility controller (7) that the pressure in the process chamber and the trapping apparatus is increased, to close the flow path through the direction switching valve (1), trapping apparatus (2) and the heating gate valve (4), and open the flow path through the bypass pipe (3) such that the bypass pipe (3) is configured to receive the inert gas.