Extreme-ultraviolet light source device using electron beams
AssigneeWorldbeam Solution Co., Ltd.
InventorKyu Chang Park
Life of this patent
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Abstract
An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal radiator. The electron beam-emitting unit comprises: a cathode electrode; a plurality of emitters located on the cathode electrode and including a carbon-based material; and a gate electrode which is located on the plurality of emitters at a distance therefrom and to which a pulse voltage is applied.
Claims10
An extreme-ultraviolet light source device, comprising:
- a discharge chamber of which the inside is maintained in a vacuum;
- an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams;
- and
- a metal radiator which is located inside the discharge chamber and is ionized by the electron beams,
- wherein extreme-ultraviolet radiation occurs in plasma generated from the metal radiator, and
- the electron beam-emitting unit includes a cathode electrode, a plurality of emitters located on the cathode electrode and including a carbon-based material, and a gate electrode which is located on the plurality of emitters at a distance from the plurality of emitters and to which a pulse voltage is applied.
Dependencies are inferred from the claim text.