Droplet analysis unit and substrate treatment apparatus including the same

A substrate treatment apparatus comprising:

• a process treatment unit supporting a substrate while the substrate is being treated;
• an inkjet head unit treating the substrate by ejecting a substrate treatment liquid onto the substrate using a plurality of nozzles;
• a gantry unit moving the inkjet head unit over the substrate;
• and
• a droplet analysis unit measuring a meniscus in each of the nozzles that is associated with the substrate treatment liquid,
• wherein
• the droplet analysis unit measures and quantifies a shape, a motion, and a position of the meniscus based on chromatic aberration as three-dimensional (3D) information regarding the meniscus and includes an image acquisition module, which acquires a 3D image of the meniscus, a glass module, which covers an outer exposed surface of the image acquisition module, a transmittance measurement module, which measures a transmittance of the glass module, a cleaning liquid spray module, which sprays a cleaning liquid onto the glass module and is driven based on the transmittance of the glass module, and a cleaning module, which cleans the surface of the glass module with the cleaning liquid and is driven based on the transmittance of the glass module, and
• the image acquisition module includes a light output module, which outputs light, a lens module, which guides the light toward the meniscus and causes the chromatic aberration, a light detection module, which detects the light, a light division module, which guides the light toward the lens module toward the meniscus and guides reflected light from the meniscus toward the light detection module, a first filter, which is disposed between the light division module and the light detection module and includes at least one pin hole for transmitting the light therethrough, and an analysis module, which quantifies the 3D information regarding the meniscus by analyzing the light detected by the light detection module.