Composition for forming organic film, patterning process, and compound and polymer for forming organic film

A compound shown by the following general formula (1),

• wherein R1 represents a hydrogen atom, an allyl group, or a propargyl group, R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group, “m” represents 0 or 1, “n” represents an integer of 1 or 2, “l” represents 0 or 1, aromatic rings forming a cyclic ether structure with one another when l=1, “k” represents an integer of 0 to 2, and W represents a divalent organic group having 1 to 40 carbon atoms.

A polymer having a repeating unit shown by the following general formula (3),

• wherein R1 represents a hydrogen atom, an allyl group, or a propargyl group, R2 represents a nitro group, a halogen atom, a hydroxy group, an alkyloxy group having 1 to 4 carbon atoms, an alkynyloxy group having 2 to 4 carbon atoms, an alkenyloxy group having 2 to 4 carbon atoms, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a trifluoromethyl group, or a trifluoromethyloxy group, “m” represents 0 or 1, “n” represents an integer of 1 or 2, “l” represents 0 or 1, aromatic rings forming a cyclic ether structure with one another when l=1, “k” represents an integer of 0 to 2, W represents a divalent organic group having 1 to 40 carbon atoms, and L represents a divalent organic group having 1 to 40 carbon atoms.