Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition

A method for manufacturing a resist film comprising:

• (1) applying a resist underlayer composition above a substrate;
• (2) heating said resist underlayer composition to form a resist underlayer film;
• (3) applying a resist composition above the resist underlayer film;
• and
• (4) heating said resist composition to form a resist film,
• wherein the resist underlayer composition comprises a polymer (A) and a solvent (B);
• where polymer (A) comprises at least one structural unit selected from the group consisting of the following Units (a), (b), (c) and (d):
• Unit (a) represented by the formula (a):
• wherein,
• Ra1 and Ra2 are each independently H, C1-5 alkyl, C1-5 alkoxy or —COOH,
• La is a single bond, C1-5 alkylene, —O— or C1-5 alkoxylene,
• ma is 1,
• Xa1 is H or a C1-5 hydrocarbon group (one or more of —CH2— in the C1-5 hydrocarbon group can be each independently replaced with —NH—, —C(═O)— and/or —O— and one or more of —CH3 in the C1-5 hydrocarbon group can be each independently replaced with —NH2 and/or —COOH,
• Ya is N or O, where when Ya is N, pa is an integer of 1 or 2, and when Ya is 0, pa is 1,
• Xa2 is H or a C1-5 hydrocarbon group (one or more of —CH2— in the C1-5 hydrocarbon group can be each independently replaced with —NH—, —C(═O)— and/or —O— and one or more of —CH3 in the C1-5 hydrocarbon group can be each independently replaced with —NH2 and/or —COOH), and when pa is 2, two Xa2 can be identical or different,
• where, Xa1 and Xa2 can be bonded and/or two Xa2 can be bonded when pa is 2, to form a saturated or unsaturated ring;
• Unit (b) selected from the group consisting of:
• Unit (c) represented by the formula (c):
• wherein,
• Rc1 and Rc2 are each independently H, C1-5 alkyl, C1-5 alkoxy or —COOH,
• mc is 1,
• Lc is a single bond, C1-5 alkylene, —O— or C1-5 alkoxylene,
• Vc is a fused aromatic hydrocarbon or a fused heterocyclic ring, and Vc has 3 to 6 rings fused,
• pc is 0 to 5,
• Rc3 is C1-5 alkyl, C1-5 alkoxy or —COOH, and when pc>1, each Rc3 can be identical or different;
• and
• Unit (d) represented by the formula (d):
• wherein,
• Rd1 and Rd2 are each independently H, C1-5 alkyl, C1-5 alkoxy or —COOH,
• md is 1,
• Ld is a single bond, C1-5 alkylene wherein one or more of —CH2— in the C1-5 alkylene can be replaced with —NH—, —C(═O)— and/or —O— and one or more of —CH3 in the C1-5 alkylene can be replaced with —OH, —NH2 and/or —COOH, —O— or C1-5 alkoxylene, wherein, na, nb, nc and nd, which are the molar numbers of repetition respectively of Units (a), (b), (c) and (d);
• wherein the polymer (A) satisfies the following formulae:
• 5%≤na/(na+nb+nc+nd)≤50%,
• 30%≤nb/(na+nb+nc+nd)≤80%, and
• 5%≤nc/(na+nb+nc+nd)≤40%
• wherein the total molar number (ntotal) of all repeating units contained in the polymer (A) satisfies the following formula:
• 80%≤(na+nb+nc+nd)/ntotal≤100%.