Method for producing trichlorosilane and method for producing polycrystalline silicon rod
AssigneeTokuyama Corporation
InventorsJunya Sakai, Shoji Iiyama, Kunihiko Matsumura
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Abstract
[Problem to be solved] Provided is a method that enables effective industrial use of an exhaust gas containing hydrogen to be discharged during production of trichlorosilane. [Solution] Provided is a method for producing trichlorosilane, the method comprising: reacting metallic silicon and tetrachlorosilane with a mixed gas containing hydrogen to generate trichlorosilane. The mixed gas containing hydrogen contains 1 to 500 molar ppm of hydrogen chloride and 100 to 10,000 molar ppm of silane hydride, and the mixed gas is heated at 100° C. to 450° C. and then reacted.
Claims8
A method for producing trichlorosilane, the method comprising:
- reacting metallic silicon and tetrachlorosilane with a mixed gas containing hydrogen to generate trichlorosilane, wherein
- the mixed gas containing hydrogen contains 1 to 500 molar ppm of hydrogen chloride and 100 to 10000 molar ppm of silane hydride, and
- the mixed gas is heated at 100° C. to 450° C. and then reacted.
Dependencies are inferred from the claim text.