Process and apparatus for the preparation of a bonded substrate
AssigneesTop Technology Ltd, Sherkin Technologies Limited
InventorsYoungho Lee, Yongtae Kim, Sangbae Kim, Donal O'Sullivan
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AssigneesTop Technology Ltd, Sherkin Technologies Limited
InventorsYoungho Lee, Yongtae Kim, Sangbae Kim, Donal O'Sullivan
Estimating the term…
The present invention relates to a process and apparatus for the preparation of a bonded substrate. More particularly, the present invention relates to a PDMS bonding apparatus. More specifically, the present invention relates to a PDMS bonding apparatus which uses plasma to bond PDMS to a substrate. The present invention discloses a PDMS bonding apparatus and process for using said apparatus, the apparatus comprising: a process chamber (100) forming a sealed processing space (S) for bonding of PDMS (polydimethylsiloxane); a first support (200) installed in the process chamber (100) and which supports the PDMS (1); a second support (300) installed in the process chamber (100) opposing the first support (200) and which supports a bonding object (2) which is bonded to the PDMS (1); a gas injection unit (400) which ejects process gas between the first support (200) and the second support (300), and; a plasma generator (500) which creates a plasma atmosphere within the process chamber (100).
A PDMS bonding apparatus comprising:
Dependencies are inferred from the claim text.