Polishing agent for synthetic quartz glass substrate, method for manufacturing the polishing agent, and method for polishing synthetic quartz glass substrate
AssigneeShin-Etsu Chemical Co., Ltd.
InventorMitsuhito Takahashi
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Abstract
A polishing agent for a synthetic quartz glass substrate contains polishing particles and water. The polishing particles are composite oxide particles of cerium and yttrium. A content by percent of the cerium in the polishing particles is 71 mol % or more and 79 mol % or less. This provides a polishing agent for a synthetic quartz glass substrate, the polishing agent being capable of sufficiently reducing generation of defects on the surface of the synthetic quartz glass substrate due to polishing without decreasing the polishing rate.
Claims13
A polishing agent for a synthetic quartz glass substrate, comprising polishing particles and water, wherein
- the polishing particles comprise composite oxide particles of cerium and yttrium,
- a content by percent of the cerium in the polishing particles is 71 mol % or more and 79 mol % or less,
- a content by percent of the yttrium in the polishing particles is 21 mol % or more and 29 mol % or less,
- the polishing particles have an average primary particle size of 100 nm to 500 nm,
- the polishing particles are wet ceria particles and
- the polishing agent has a pH within a range of 3.0 or more and 8.0 or less.
Dependencies are inferred from the claim text.