Line narrowing gas laser device, wavelength control method, and electronic device manufacturing method

A wavelength control method for controlling a center wavelength of pulse laser light output from a line narrowing gas laser device, comprising:

• reading parameters including a number of irradiation pulses of pulse laser light to be radiated to one location of an irradiation receiving object, a shortest wavelength, and a longest wavelength;
• setting a first pattern with which the center wavelength is changed to approach the longest wavelength from the shortest wavelength and a second pattern with which the center wavelength is changed to approach the shortest wavelength from the longest wavelength such that at least one of the first pattern and the second pattern is different between a case in which the number of irradiation pulses is an even number and a case in which the number of irradiation pulses is an odd number;
• and
• controlling an actuator that changes the center wavelength so that the first pattern and the second pattern are alternately performed.

An electronic device manufacturing method, comprising:

• generating pulse laser light using a line narrowing gas laser device;
• outputting the pulse laser light to an exposure apparatus;
• and
• exposing a photosensitive substrate to the pulse laser light in the exposure apparatus to manufacture an electronic device,
• the line narrowing gas laser device including:
• an actuator configured to change a center wavelength of the pulse laser light;
• and
• a processor configured to control the actuator, and
• the processor reading parameters including a number of irradiation pulses of the pulse laser light to be radiated to one location of an irradiation receiving object, a shortest wavelength, and a longest wavelength;
• setting a first pattern with which the center wavelength is changed to approach the longest wavelength from the shortest wavelength and a second pattern with which the center wavelength is changed to approach the shortest wavelength from the longest wavelength such that at least one of the first pattern and the second pattern is different between a case in which the number of irradiation pulses is an even number and a case in which the number of irradiation pulses is an odd number;
• and
• controlling the actuator so that the first pattern and the second pattern are alternately performed.