Large area microwave plasma CVD apparatus
AssigneeVestlandets Innovasjonsselskap AS
InventorJustas Zalieckas
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Abstract
A large area microwave plasma chemical vapour deposition, LA MPCVD reactor apparatus and method for large area microwave chemical vapour deposition, comprising a reactor chamber adapted to provide a plasma region in an interior of the reactor chamber by electromagnetic energy at a first frequency, and a CRLH waveguide section adapted to operate with an infinite wavelength at the first frequency and having in a wall a coupler means arranged to couple electromagnetic energy from an interior of the CRLH waveguide section to the interior of the reactor chamber.
Claims13
A large area microwave plasma chemical vapour deposition (LA MPCVD) reactor apparatus, comprising:
- a reactor chamber adapted to provide a plasma region in an interior of the reactor chamber by electromagnetic energy at a first frequency;
- a Composite Right/Left-Handed (CRLH) waveguide section comprising a plurality of periodically cascaded unit cells, each unit cell being balanced, wherein the CRLH waveguide section is adapted to operate with an infinite wavelength at the first frequency and having in a wall of the CRLH waveguide section a coupler arranged to couple electromagnetic energy from an interior of the CRLH waveguide section to the interior of the reactor chamber;
- and
- a first sub-chamber and a second sub-chamber,
- wherein the first sub-chamber comprises the coupler,
- wherein the second sub-chamber is adapted to comprise the plasma region, and
- wherein the electromagnetic energy is provided from the CRLH waveguide section to the second sub-chamber via the first sub-chamber.
Dependencies are inferred from the claim text.