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US 12,436,361 B2Granted
Projection exposure apparatus for semiconductor lithography
AssigneeCarl Zeiss SMT GmbH
InventorsJoachim Hartjes, Alexander Wolf, Toralf Gruner
Life of this patent
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Abstract
A projection exposure apparatus for semiconductor lithography includes a mirror and a temperature-regulating device for regulating temperature on the basis of radiation. The mirror includes at least one cutout. The temperature-regulating device includes a temperature-regulating body arranged without contact in the cutout of the mirror. The temperature-regulating body has a cavity. A fluid for temperature regulation of the temperature-regulating body is present in the cavity.
Claims20
An apparatus, comprising:
- a mirror comprising a cutout;
- a temperature-regulating body in the cutout of the mirror;
- and
- a sensor configured to detect a distance between the temperature-regulating body and an inner surface of the cutout,
- wherein:
- the temperature-regulating body comprises a cavity configured to allow a fluid to flow therethrough to regulate a temperature of the temperature-regulating body;
- the temperature-regulating body does not contact the cutout of the mirror;
- and
- the apparatus is a semiconductor lithography projection exposure apparatus.
6 more elements
A system, comprising:
- a mirror comprising cutout;
- a temperature-regulating body in the cutout of the mirror;
- and
- a sensor configured to detect a distance between the temperature-regulating body and an inner surface of the cutout,
- wherein:
- the temperature-regulating body comprises a cavity configured to allow a fluid to flow therethrough to regulate a temperature of the temperature-regulating body;
- the temperature-regulating body does not contact the cutout of the mirror;
- and
- the system is a semiconductor lithography illumination system.
6 more elements
Dependencies are inferred from the claim text.