Substrate processing method and storage medium

A substrate processing method of forming a coating film on a peripheral edge portion including a first peripheral edge of a front surface of a substrate and a side surface of the substrate, the substrate processing method comprising:

• supplying a first chemical liquid onto the peripheral edge portion of the substrate including a rear surface of the substrate;
• removing, among the first chemical liquid supplied onto the substrate, a portion of the first chemical liquid adhering to the front surface and the side surface of the substrate by supplying a first solvent onto the first peripheral edge, after the supplying a first chemical liquid;
• supplying a second chemical liquid for forming the coating film on the front surface and the side surface of the substrate, after the removing a portion of the first chemical liquid;
• and
• removing the first chemical liquid remaining on the substrate to which the second chemical liquid adheres by supplying a second solvent onto a second peripheral edge of the rear surface of the substrate, after the supplying a second chemical liquid.