Back to results
US 12,435,410 B2Granted
Substrate processing system and substrate processing method
AssigneeTokyo Electron Limited
InventorKoji Maeda
Life of this patent
Estimating the term…
Abstract
There is provided a substrate processing system comprising: a plurality of transfer modules having transfer mechanisms configured to transfer substrates; and a plurality of process modules connected to the plurality of transfer modules. The transfer mechanisms of the plurality of transfer modules transfer a plurality of substrates sequentially and serially to the plurality of process modules, and each of the plurality of transfer modules has an aligner configured to align a substrate when transferring the substrate to the process module connected to a relevant transfer module.
Claims8
A substrate processing system comprising:
- a plurality of transfer modules having transfer mechanisms configured to transfer substrates;
- and
- a plurality of process modules connected to the plurality of transfer modules,
- wherein at least one of the plurality of process modules is a film forming
- apparatus for performing sputtering film formation on a substrate,
- wherein the at least one of the plurality of process modules performs the sputtering film formation of a magnetic film by sputtering plasma to a magnetic target while applying a magnetic field using a ring magnet disposed around the substrate,
- wherein the transfer mechanisms of the plurality of transfer modules transfer a plurality of substrates sequentially and serially to the plurality of process modules, and
- each of the plurality of transfer modules has an aligner contained within the transfer module that is configured to align a substrate when transferring the substrate to one of the plurality of process modules,
- wherein, in each of the transfer modules, the aligner that is contained within the transfer module is disposed on a transfer path of the transfer mechanism when transferring the substrate to a substrate holder of one of the plurality of process modules and the aligner is disposed on a straight line that connects a rotation center of the transfer mechanism and a center of the substrate holder of one of the plurality of process modules,
- wherein the aligner is configured to detect a position of a notch of the substrate based on light emitted by a light emitting device being received by a light receiving device, and a direction of the magnetic field of the ring magnet and an angle of the notch formed at the substrate are adjusted to a predetermined angle in the at least one of the plurality of process modules based on a detected notch position.
7 more elements
A substrate processing method comprising:
- preparing a substrate processing system including a plurality of transfer modules having transfer mechanisms configured to transfer substrates and a plurality of process modules connected to the plurality of transfer modules, wherein at least one of the plurality of process modules is a film forming apparatus for performing sputtering film formation on a substrate and the at least one of the plurality of process modules performs the sputtering film formation of a magnetic film by sputtering plasma to a magnetic target while applying a magnetic field using a ring magnet disposed around the substrate;
- sequentially and serially transferring the substrates to the plurality of process modules by the transfer mechanisms respectively disposed in the transfer modules;
- aligning a substrate by an aligner contained within a transfer module from the plurality of transfer modules at the time of transferring the substrate to one of the plurality of process modules by the transfer mechanism in each of the transfer modules;
- and
- processing the substrates in the plurality of process modules,
- wherein the alignment by the aligner that is contained within the transfer module is performed in a state where the aligner is disposed on a transfer path of the transfer mechanism at the time of transferring the substrate to a substrate holder of one of the plurality of process modules and the alignment is performed in a state where the aligner is disposed on a straight line that connects a rotation center of the transfer mechanism and a center of the substrate holder of one of the plurality of process modules,
- wherein a position of a notch of the substrate is detected by the aligner based on light emitted by a light emitting device being received by a light receiving device, and a direction of the magnetic field of the ring magnet and an angle of the notch formed at the substrate are adjusted to a predetermined angle in the at least one of the plurality of process modules based on a detected notch position.
4 more elements
Dependencies are inferred from the claim text.