Method for etching at least one surface of a plastic substrate
AssigneeAtotech Deutschland GmbH
InventorsFrank Bayer, Carl Christian Fels, Philip Hartmann, Torsten Voss
Life of this patent
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Abstract
The present invention relates to a method for etching at least one surface of a plastic substrate, the method comprising steps (A) to (C), wherein step (B) comprises a contacting with a pre-treatment composition comprising one or more than one fluorine-free surface-active compound, and step (C) comprises a contacting with an etching composition comprising one or more than one manganese species, wherein after step (B) and prior to step (C) no rinsing is applied, and the etching composition is substantially free of, preferably does not comprise, fluorine-containing surface-active compounds.
Claims15
A method for etching at least one surface of a plastic substrate, the method comprising the steps
- (A) providing the substrate,
- (B) contacting the substrate with a pre-treatment composition such that a pre-treated substrate is obtained, the pre-treatment composition comprising
- (B-a) one or more than one fluorine-free surface-active compound,
- and
- (C) contacting the pre-treated substrate with an etching composition in an etching compartment such that an etched substrate is obtained, the etching composition comprising
- (C-a) one or more than one manganese species,
- characterized in that
- the pre-treated substrate is not rinsed after step (B) and prior to step (C), and
- the etching composition is substantially free of fluorine-containing surface-active compounds.
Dependencies are inferred from the claim text.