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US 12,431,334 B2Granted
Gas distribution assembly
AssigneeASM IP Holding B.V.
InventorsYukihiro Mori, Vincent Hubert Bernard Gilles Babin, Naoto Tsuji
Life of this patent
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Abstract
A gas distribution assembly and methods for adjusting the gas flow through a gas supply unit into a reaction chamber are disclosed. The gas distribution assembly and methods can be used to increase or decrease gas flow uniformly through the gas supply unit. The gas distribution assembly and methods can also be used to increase gas flow into one area of the reaction chamber, while decreasing gas flow into another area.
Claims16
A gas distribution assembly for distributing a gas to a reaction chamber comprising:
- a gas manifold,
- a gas channel below the gas manifold,
- a shower plate assembly below the gas channel and in fluid communication with the gas manifold, wherein the shower plate assembly comprises a thickness between an upper surface of the shower plate assembly and a lower surface of the shower plate assembly, wherein the thickness of the shower plate assembly is greater at a center of the shower plate assembly than an edge of the shower plate assembly, wherein a plurality of apertures extend from the upper surface of the shower plate assembly to the lower surface of the shower plate assembly and
- one or more adjustable gap devices interposed between and mechanically coupled to the gas channel and the shower plate assembly;
- wherein a gap is formed between a lower surface of the gas channel and the upper surface of the shower plate assembly;
- wherein the shower plate assembly comprises a perimeter region coupled to the one or more adjustable gap devices exterior of the gap, and an inclined region underlying the gas channel and the gas manifold;
- and
- wherein the one or more adjustable gap devices are configured to move the gas channel relative to the shower plate assembly, thereby adjusting the size of the gap.
5 more elements
Dependencies are inferred from the claim text.