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AssigneeApplied Materials, Inc.
InventorsAaron P. Webb, Krag R. Senior, Chris Czajka, Charles T. Carlson, Jason M. Schaller
Estimating the term…
An ion implantation system including an ion source for generating an ion beam, an end station for holding a substrate to be implanted by the ion beam, and a linear accelerator disposed between the ion source and the end station and adapted to accelerate the ion beam, the linear accelerator comprising at least one acceleration stage including a resonator coil coupled to a drift tube assembly, the drift tube assembly including a first drift tube coupled to a first end of a first insulting rod via interference fit, a second drift tube coupled to a first end of a second insulting rod via interference fit, and a mounting bracket coupled to a second end of the first insulting rod and to a second end of the second insulting rod via interference fit.
An ion implantation system comprising:
A drift tube assembly for an ion implantation system, the drift tube assembly comprising:
A method of assembling a drift tube assembly, the method comprising:
Dependencies are inferred from the claim text.