System and method for generating a focused x-ray beam
AssigneeSigray, Inc.
InventorsBenjamin Donald Stripe, Wenbing Yun, Janos Kirz, Thomas James Smart, Mark Antoine Cordier, Sylvia Jia Yun Lewis
Life of this patent
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Abstract
An apparatus includes at least one x-ray source configured to generate x-rays and at least one capillary x-ray focusing optic configured to receive and focus at least some of the generated x-rays into a focused x-ray beam. The apparatus further includes at least one x-ray optical component configured to receive the generated x-rays and/or the focused x-ray beam such that a focus size δ1 of the focused x-ray beam is smaller than a focus size δ0 of the focused x-ray beam without the at least one x-ray optical component.
Claims20
An apparatus comprising:
- at least one x-ray source configured to generate x-rays;
- at least one capillary x-ray focusing optic configured to receive and focus at least some of the generated x-rays into a focused x-ray beam;
- and
- at least one x-ray optical component configured to receive the generated x-rays and/or the focused x-ray beam such that a focus size δ1 of the focused x-ray beam is smaller than a focus size δ0 of the focused x-ray beam without the at least one x-ray optical component.
An apparatus comprising:
- at least one x-ray source configured to generate x-rays;
- at least one capillary x-ray focusing optic configured to receive and focus at least some of the generated x-rays into a focused x-ray beam;
- and
- at least one x-ray optical component configured to receive the generated x-rays and/or the focused x-ray beam such that a collective point spread function (PSF) of the at least one x-ray focusing optic and the at least one x-ray optical component is below 1 micron.
Dependencies are inferred from the claim text.