Measurement method, imprint apparatus, and article manufacturing method

An imprint apparatus that forms a pattern of an imprint material on a substrate using a mold, the apparatus comprising:

• a holding unit including a holding surface configured to hold the substrate;
• a drive unit configured to drive the holding unit in a floating state;
• a measurement unit configured to measure a height of a pattern surface of the mold or a height of the substrate held by the holding surface;
• and
• a control unit configured to perform processing of controlling an attitude of at least one of the mold and the substrate such that the pattern surface of the mold and a surface of the substrate become parallel to each other,
• wherein the processing comprises:
• while relatively driving the measurement unit with respect to a measurement target region of the pattern surface of the mold or the surface of the substrate in a first direction by the drive unit, obtaining first measurement information indicating a height of the pattern surface of the mold or a height of the surface of the substrate in each of a plurality of first measurement lines parallel to the first direction and different from each other by measuring each of the plurality of first measurement lines by the measurement unit,
• while driving the measurement unit with respect to the measurement target region of the pattern surface of the mold or the surface of the substrate in a second direction crossing all of the plurality of first measurement lines by the drive unit, obtaining second measurement information indicating a height of the pattern surface of the mold or a height of the surface of the substrate in one second measurement line parallel to the second direction by measuring the second measurement line by the measurement unit,
• generating first distribution information indicating a height distribution of the pattern surface of the mold or a height distribution of the surface of the substrate based on the first measurement information and the second measurement information, and
• generating second distribution information indicating a height distribution of the holding surface configured to hold the substrate based on the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which an angle of the substrate around a vertical axis of the substrate on the holding surface is set to a first angle, and the first measurement information and the second measurement information obtained in the obtaining the first measurement information and in the obtaining the second measurement information, respectively, in a state in which the angle of the substrate around the vertical axis of the substrate on the holding surface is set to a second angle different from the first angle.