Microfabrication method
AssigneeDexerials Corporation
InventorsAkihiro Shibata, Naoto Kaneko, Tsunemoto Kuriyagawa
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Abstract
A microfabrication method is provided with which it is possible to easily form a fine periodic structure on a surface of any substrate. A glass precursor is applied to a substrate, and the glass precursor is irradiated with short-pulse laser light. By the irradiation with short-pulse laser light, the glass precursor is activated to undergo a thermal reaction, and a fine periodic structure can be easily formed on the surface. Furthermore, by oxidizing the substrate on which the fine periodic structure has been formed, the hue of the surface can be improved while maintaining the fine periodic structure.
Claims12
A production method for an antireflection film comprising:
- applying a glass precursor onto a substrate;
- irradiating a single-beam short pulse laser to the glass precursor, and forming a silica layer having a periodic structure of a size smaller than a wavelength of the single-beam short pulse laser;
- and
- oxidizing the silica layer formed by irradiating the single-beam short pulse laser to the glass precursor, the periodic structure being transparent,
- wherein the glass precursor is polysilazane having —(SiH2NH)— as a base unit, a pulse duration of the single-beam short pulse laser is between 0.01 picoseconds and 5 picoseconds, and a fluence range of the single-beam short pulse laser is 0.01 J/cm2 to 1.0 J/cm2,
- wherein the periodic structure has linear or dotted protrusions of a periodic nature with a pitch between 50 nm and 1000 nm and a depth between 10 nm and 1000 nm, and
- wherein the applying the glass precursor coats the glass precursor to a thickness of 100 nm to 5 μm.
Dependencies are inferred from the claim text.