Semiconductor system with waveguide assembly with RF signal impedance controllable by applied electromagnetic radiation

A system for impeding a radio frequency (RF) signal, the system comprising a waveguide assembly integrated with a semiconductor wafer and comprising:

• a waveguide channel defined by internal walls of the semiconductor wafer lined with a metallic layer comprising gold, copper, nickel, aluminum, chromium, titanium tungsten, platinum, or silver, the waveguide channel comprising:
• at least one port for transmission of the RF signal into or out of the waveguide channel;
• a first waveguide channel section;
• a second waveguide channel section;
• and
• a third waveguide channel section,
• wherein the first waveguide channel section is disposed between the second waveguide channel section and the third waveguide channel section, and
• wherein a channel transverse width of the first waveguide channel section is less than a channel transverse width of the second waveguide channel section and the third waveguide channel section, and
• at least one semiconductor obstacle member disposed in the waveguide channel in the first waveguide channel section,
• wherein the at least one semiconductor obstacle member is responsive to applied electromagnetic radiation to vary electrical conductance of the at least one semiconductor obstacle member, and thereby vary the electrical impedance of the at least one semiconductor obstacle member to transmission of the RF signal through the waveguide channel.