Apparatus and method for controlling a substrate temperature
AssigneeNHK Spring Co., Ltd.
InventorsNaoya Kida, Arata Tatsumi, Kenji Sekiya, Naoya Aikawa, Masaya Takanashi
Life of this patent
Estimating the term…
Abstract
A stage includes a shaft, a first supporting plate over the shaft, a heater arranged in a trench formed in the first supporting plate, and a gas-supplying tube arranged in the shaft and configured to blow a gas to the first supporting plate. The first supporting plate may have a disk shape, and a cross section of the gas-supplying tube parallel to a surface of the first supporting plate may overlap a center of the disk shape. The first supporting plate may be configured to block the gas so that the gas is not released to a chamber in which the stage is arranged.
Claims12
A stage comprising:
- a shaft;
- a first supporting plate over the shaft;
- a heater arranged in a trench formed in the first supporting plate;
- and
- a gas-supplying tube arranged in the shaft and configured to blow a gas to the first supporting plate,
- wherein a tip of the gas-supplying tube is spaced in an extending direction of the gas-supplying tube from an end of the shaft over which the first supporting plate is positioned, and is located under the end of the shaft.
A method for controlling a substrate temperature, the method comprising:
- arranging a substrate over a first stage comprising a first supporting plate and a shaft under the first supporting plate;
- heating the first stage with a heater arranged in a trench formed in the first supporting plate;
- and
- blowing a gas to the first supporting plate from a gas-supplying tube arranged in the shaft,
- wherein a tip of the gas-supplying tube is spaced in an extending direction of the gas- supplying tube from an end of the shaft over which the first supporting plate is positioned, and is located under the end of the shaft.
Dependencies are inferred from the claim text.