Magnetic thin film laminated structure and micro-inductive device thereof

A micro-inductive device comprising:

• a magnetic core fabricated by a magnetic thin film laminated structure, the magnetic thin film laminated structure including:
• a first layer structure, wherein:
• the first layer structure includes a first adhesive layer coupled to a workpiece by sputtering deposited process;
• the adhesive layer comprises a material having compressive stress which is chosen from at least one of a Ta film, a TaN film, or a TiN film;
• and
• at least a first pair of layers coupled to the adhesive layer by sputtering deposited process, wherein the at least a first pair of layers comprises a magnetic film layer and an isolation layer, and a first additional magnetic film layer coupled on the at least a first pair of layers by sputtering deposited process;
• and
• a second layer structure, wherein:
• the second layer structure coupled on the first layer structure by sputtering deposited process, wherein the second layer structure comprises a second adhesive layer coupled on the first additional magnetic film layer by sputtering deposited process;
• wherein the second adhesive layer includes a material having compressive stress which is chosen from at least one of a Ta film, a TaN film, or a TiN film;
• and
• at least a second pair of layers coupled on the second adhesive layer by sputtering deposited process, each of the at least a second pair of layers comprises a magnetic film layer and an isolation layer, and a second additional magnetic film layer coupled on the at least a second pair of layers by sputtering deposited process;
• wherein an application frequency of the micro-inductive device ranges from 100 MHz to 5 GHz.