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US 12,422,752 B2Granted
Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
AssigneeFUJIFILM Corporation
InventorsAkihiro Kaneko, Masafumi Kojima, Minoru Uemura, Akiyoshi Goto, Michihiro Shirakawa
Life of this patent
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Abstract
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which an A value determined by Formula (1) is 0.130 or more, and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III).
Claims20
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
- a resin;
- and
- a compound that generates an acid upon irradiation with actinic rays or radiation,
- wherein an A value of the resin composition determined by Formula (1) is 0.130 or more, and
- the compound is the following compound (I),
- A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127) Formula (1):
- in Formula (1), each of [H], [C], [N], [O], [F], [S], and [I], represents a molar ratio of hydrogen atoms, carbon atoms, nitrogen atoms, oxygen atoms, fluorine atoms, sulfur atoms, and iodine atoms, respectively, derived from a total solid content in the resin composition with respect to all atoms of the total solid content in the resin composition:
- compound (I):
- a compound of Formula (Ia):
- M11+A11−-L1-A12−M12+ (Ia),
- wherein M11+ and M12+ each independently represents an organic cation,
- A11− and A12− each independently represents an anionic functional group,
- A11− and A12− are different, and
- L1 represents a divalent linking group, and
- wherein, in a compound PIa (HA11-L1-A12H) formed by substituting M11+ and M12+ with H+ in Formula (Ia), an acid dissociation constant a2 derived from an acidic moiety represented by A12H is 2.0 or less and is larger than an acid dissociation constant a1 derived from an acidic moiety represented by HA11, and
- a difference between a1 and a2 is 2.0 or more,
13 more elements
An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
- a resin;
- and
- a compound that generates an acid upon irradiation with actinic rays or radiation,
- wherein an A value of the resin composition determined by Formula (1) is 0.130 or more, and
- the compound is compound (I),
- A=([H]×0.04+[C]×1.0+[N]×2.1+[O]×3.6+[F]×5.6+[S]×1.5+[I]×39.5)/([H]×1+[C]×12+[N]×14+[O]×16+[F]×19+[S]×32+[I]×127) Formula (1):
- in Formula (1), each of [H], [C], [N], [O], [F], [S], and [I], represents a molar ratio of hydrogen atoms, carbon atoms, nitrogen atoms, oxygen atoms, fluorine atoms, sulfur atoms, and iodine atoms, respectively, derived from a total solid content in the resin composition with respect to all atoms of the total solid content in the resin composition:
- compound (I):
- a compound of Formula (Ia):
- wherein M11+A11−-L1−A12−M12+ (Ia),
- M11+ and M12+ each independently represents an organic cation,
- A11− and A12− each independently represents an anionic functional group,
- A11− and A12− are different, and
- L1 represents a divalent linking group, and
- wherein, in a compound PIa (HA11-L1-A12H) formed by substituting M11+ and M12+ with H+ in Formula (Ia), an acid dissociation constant a2 derived from an acidic moiety represented by A12H is larger than an acid dissociation constant a1 derived from an acidic moiety represented by HA11 and
- a difference between a1 and a2 is 2.0 or more,
- wherein A11− is a group represented by Formula (B-8) or (B-10), and A12− is a group represented by Formula (B-1) to (B-5), (B-7), (B-9), or (B-11) to (B-13):
- wherein, in Formulae (B-1) to (B-5), and (B-7) to (B-13), * represents a bonding position,
- in Formulae (B-1) to (B-5), and (B-12), RX1 represents an organic group,
- in Formulae (B-7) and (B-11), RX2 represents a hydrogen atom, or a substituent other than a fluorine atom and a perfluoroalkyl group,
- in Formula (B-8), RXF1 represents a hydrogen atom, a fluorine atom, or a perfluoroalkyl group, wherein at least one of the plurality of RXF1's represents a fluorine atom or a perfluoroalkyl group,
- in Formula (B-10), RXF2 represents a fluorine atom or a perfluoroalkyl group, and
- in Formula (B-9), n represents an integer of 0 to 4.
20 more elements
Dependencies are inferred from the claim text.