Plasmonic device and a method for fabricating a plasmonic device

A plasmonic device comprising

• a substrate,
• a plasmonic section arranged on the substrate, the plasmonic section including at least one inorganic confining structure adjacent to an organic optical material providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• a protective layer covering and/or enclosing the organic optical material,
• wherein the protective layer has an oxygen permeation rate below at least one of 100 cm3/(m2 day), 1×10−0 cm3/(m2 day), 1×10−2 cm3/(m2 day), and 1×10−4 cm3/(m2 day).

A plasmonic device comprising

• a substrate,
• a plasmonic section arranged on the substrate, the plasmonic section including at least one inorganic confining structure adjacent to an organic optical material providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• a protective layer covering and/or enclosing the organic optical material,
• wherein the protective layer includes a combination of an inorganic material and an organic material.

A plasmonic device comprising

• a substrate,
• a plasmonic section arranged on the substrate, the plasmonic section including at least one inorganic confining structure adjacent to an organic optical material providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• a protective layer covering and/or enclosing the organic optical material,
• wherein the protective layer includes a first protective sublayer and a second protective sublayer, and
• wherein the protective sublayers include different materials.

A plasmonic device comprising

• a substrate,
• a plasmonic section arranged on the substrate, the plasmonic section including more than one inorganic confining structure adjacent to an organic optical material providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and wherein the confining structures comprise electrodes, and
• a protective layer covering and/or enclosing the organic optical material,
• auxiliary electrical components, and
• further auxiliary components,
• wherein the auxiliary electrical components form electrical lines providing an electrical connection between the further auxiliary components and the inorganic confining structures, and
• wherein the electrodes are covered by the protective layer, and
• wherein the auxiliary electrical components are partially covered by the protective layer, thereby providing access to the auxiliary electrical components.

A method for fabricating a plasmonic device, the method comprising:

• providing a substrate,
• arranging on the substrate a plasmonic section which includes at least one inorganic confining structure adjacent to an organic optical material for providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• depositing a protective layer for covering and/or enclosing the organic optical material for improved reliability of the plasmonic waveguide, wherein
• the protective layer is deposited by means of one or more thin film deposition processes including at least one of an atomic layer deposition process, a sputtering process, and a molecular layer deposition process.

A method for fabricating a plasmonic device, the method comprising:

• providing a substrate,
• arranging on the substrate a plasmonic section which includes at least one inorganic confining structure adjacent to an organic optical material for providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• depositing a protective layer for covering and/or enclosing the organic optical material for improved reliability of the plasmonic waveguide, wherein
• the protective layer is manufactured with a structured design using at least one of a lithographic process and a masking process.

A method for fabricating a plasmonic device, the method comprising:

• providing a substrate,
• arranging on the substrate a plasmonic section which includes at least one inorganic confining structure adjacent to an organic optical material for providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• depositing at least one protective layer for covering and/or enclosing the organic optical material for improved reliability of the plasmonic waveguide,
• wherein the depositing of the at least one protective layer comprises:
• depositing a first protective layer,
• followed by wire-bonding, and
• followed by depositing a second protective layer.

A method for fabricating a plasmonic device, the method comprising:

• providing a substrate,
• arranging on the substrate a plasmonic section which includes at least one inorganic confining structure adjacent to an organic optical material for providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• depositing a protective layer for covering and/or enclosing the organic optical material for improved reliability of the plasmonic waveguide,
• wherein the protective layer is deposited in a deposition process applied at temperatures of at least one of:
• below 200° C., below 140° C., and below 100° C.

A method for fabricating a plasmonic device, the method comprising:

• providing a substrate,
• arranging on the substrate a plasmonic section which includes at least one inorganic confining structure adjacent to an organic optical material for providing a plasmonic waveguide, wherein the organic optical material is arranged in a limited area, and
• depositing a protective layer for covering and/or enclosing the organic optical material for improved reliability of the plasmonic waveguide, wherein the depositing of the protective layer comprises:
• depositing a plurality of protective sublayers and
• using one or more of the protective sublayer as a mask for structuring the organic optical material in the limited area.