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US 12,421,479 B2Granted
Cleaning agent and method for manufacturing semiconductor device
AssigneesKabushiki Kaisha Toshiba, Toshiba Electronic Devices & Storage Corporation
InventorsDaisuke Koike, Yuning Tsai
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Abstract
According to one embodiment, there is provided a cleaning agent. The cleaning agent includes an azole-based compound having a group including at least one selected from the group consisting of a glycidyl group, a hydrolyzable silyl group, and an amino group.
Claims12
A cleaning agent comprising from 1 wt % to 10 wt % of an azole-based compound comprising a glycidyl group, wherein the glycidyl group is directly attached to the azole-based compound.
Dependencies are inferred from the claim text.